Plasma Etching: Fundamentals and Applications
Author:   M. Sugawara (Professor, Professor, Hachinohe Institute of Technology, Japan)
Publisher:   Oxford University Press
Volume:   7
ISBN:  

9780198562870


Pages:   356
Publication Date:   28 May 1998
Format:   Hardback
Availability:   In Print   Availability explained
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Plasma Etching: Fundamentals and Applications


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Author:   M. Sugawara (Professor, Professor, Hachinohe Institute of Technology, Japan)
Publisher:   Oxford University Press
Imprint:   Oxford University Press
Volume:   7
Dimensions:   Width: 16.30cm , Height: 2.30cm , Length: 24.20cm
Weight:   0.743kg
ISBN:  

9780198562870


ISBN 10:   019856287
Pages:   356
Publication Date:   28 May 1998
Audience:   College/higher education ,  Tertiary & Higher Education
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

Table of Contents

1: Introduction 2: RF discharges 3: Physical basis of plasma etching process 4: Diagnostics of plasma particles and potentials 5: Technology of reactive ion etching 6: Magnetic field coupled etchers 7: ECR plasma etchers 8: Future propects Index

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Author Information

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430

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