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OverviewThis book provides a comprehensive and updated 'state-of-the-art' compilation on nanolithography and implications on future nanometer IC designs. Its scope in a bottom-up manner, includes the underlying equipment and process issues for nanolithography, the computational lithography aspects, and the key design and CAD issues and possible solutions. The subjects covered include: introduction of nanolithography process and trends; computational lithography (including lithography simulations, OPC, inverse lithography, pixilated mask, source mask optimization, etc.); lithography-aware analysis & design; and, future lithography technologies and EDA impact. Full Product DetailsAuthor: David Z. Pan , Vivek SinghPublisher: Springer-Verlag New York Inc. Imprint: Springer-Verlag New York Inc. Edition: 2013 ISBN: 9781441961563ISBN 10: 1441961569 Pages: 400 Publication Date: 01 November 2012 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: Awaiting stock  The supplier is currently out of stock of this item. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out for you. Table of ContentsOptical Lithography Process and Trends.- Computational Lithography.- Litho-aware Analysis and Design.- Future Lithography Technologies and EDA Impact.ReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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