Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons
Author:   David Cameron ,  Arthur Sherman
Publisher:   Wiley-Scrivener
Edition:   2nd
ISBN:  

9781299619128


Pages:   274
Publication Date:   01 January 2013
Format:   Electronic book text
Availability:   Available To Order   Availability explained
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Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons


Overview

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Full Product Details

Author:   David Cameron ,  Arthur Sherman
Publisher:   Wiley-Scrivener
Imprint:   Wiley-Scrivener
Edition:   2nd
ISBN:  

9781299619128


ISBN 10:   1299619126
Pages:   274
Publication Date:   01 January 2013
Audience:   General/trade ,  General
Format:   Electronic book text
Publisher's Status:   Active
Availability:   Available To Order   Availability explained
We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately.

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