Overview

Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int

Full Product Details

Author:   Ohmi
Publisher:   Taylor & Francis Ltd
Imprint:   CRC Press
ISBN:  

9780367402341

ISBN 10:   0367402343
Pages:   944
Publication Date:   30 August 2019
Audience:   College/higher education ,  Tertiary & Higher Education
Format:   Paperback
Publisher's Status:   Forthcoming
Availability:   Not yet available  
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Table of Contents

Quality of Ultrapure Water Requirements for Ultrapure Water, Takaaki Fukumoto The Structure of Water, Shoji Kubota Wafer Cleanliness and Requirements for Ultrapure Water Quality, Yoshiaki Matsushita Properties of Ultrapure Water, Shoji Kubota Afterword, Takaaki Fukumoto Ultrapure Production Systems Introduction, Koichi Yabe Pretreatment System, Kenichi Ushikoshi The Primary Treatment System, Isamu Sugiyama and Yoshitaka Yamaki Ultrapure Water System, Koichi Yabe Piping System, Takeshi Shinoda Reuse of Wastewater, Riichi Ikegami Field Data Operation Data for Actual Units, Ikuo Shindo Examples of Operation Data, Yoshito Motomura Operation Management and Cost, Hiromi Kohmoto Hot Ultrapure Water System, Yoshito Motomura Afterword, Koichi Yabe Elementary Technology Introduction, Yoshiharu Ohta Membranes Membrane Technology, Norihisa Urat Ultrafiltration, Hiroaki Ishikawa Membrane Filtration, Koichi Sawada Ion-Exchange Resin, Kenji Oda Deaeration Technology, Hitoshi Sato Sterilization Technique, Masao Saito TOC Removal Technology, Tetsuo Mizuniwa Static Electricity Removal Method, Takeo Makabe Afterword, Yoshiharu Ohta Equipment and Piping Materials Introduction, Takeshi Shinoda Piping, Koichi Yabe Valves and Fittings, Mitsugu Abe Pumps, Takashi Imaoka Tanks, Koichi Wada Heat Exchangers, Kazuhiko Takino Afterword, Takeshi Shinoda Instrumentation Introduction, Tetsuo Mizuniwa Instruments for Operational Control, Kazuhiko Takino On-Line Monitors High-Sensitivity Resistivity Meter, Makoto Saito TOC Monitor, Masami Miura Automatic TOC Analyzer: Wet Oxidation at High Temperature and Pressure, Yoshio Senoo Ultraviolet-Promoted Chemical Oxidation TOC Analyzer, Yoshiki Shibata Particle Counter, Hirotake Shigemi and Toshio Kumagai Nano-Sized Particle Analyzer (Nanolyzer), Takashi Sasaki Particle Counter for Fine Particles in Ultrapure Water, Toshiki Manabe High-Purity Monitor, Seiichi Inagaki Total Solids Monitor, Sankichi Takahashi and Toshihiko Kaneko Silica Analyzer for Ultrap

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