|
![]() |
|||
|
||||
OverviewFull Product DetailsAuthor: Kamil A. ValievPublisher: Springer Science+Business Media Imprint: Kluwer Academic/Plenum Publishers Edition: 1992 ed. Dimensions: Width: 17.80cm , Height: 2.50cm , Length: 25.40cm Weight: 2.600kg ISBN: 9780306435782ISBN 10: 0306435780 Pages: 493 Publication Date: 31 March 1992 Audience: College/higher education , Professional and scholarly , Undergraduate , Postgraduate, Research & Scholarly Format: Hardback Publisher's Status: Active Availability: In Print ![]() This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of Contents1. Forming Electron Beams of Submicron Cross Section.- 2. The Physics of the Interactions between Fast Electrons and Matter.- 3. The Physics of Ion-Beam Lithography.- 4. The Physics of X-Ray Microlithography.- 5. Optical Lithography.- 6. Procedures for Processing Exposed Resist Films and Resist Mask Topography.ReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |