Overview

While much of traditional surface science has been concerned with equilibrium properties and simple kinetics, there is a growing effort in the area of dynamical processes at surfaces. This book draws together a series of chapters written by acknowledged experts in the field, which describe progress in a range of specific topics. The emphasis is on chemical reaction dynamics, including both theoretical and experimental approaches and covering work on low index single crystal surfaces, on stepped surfaces and on supported metal clusters. Other processes, such as surface diffusion are also addressed. Further chapters discuss dynamical processes in electronically-induced desorption, and in surface diffusion on semiconductors and metals.

Full Product Details

Author:   D. P. Woodruff (University of Warwick, Warwick, U.K.)
Publisher:   Elsevier Science & Technology
Imprint:   Elsevier Science Ltd
Volume:   v. 11
Dimensions:   Width: 16.50cm , Height: 1.90cm , Length: 24.00cm
Weight:   0.862kg
ISBN:  

9780444514370

ISBN 10:   0444514376
Pages:   394
Publication Date:   07 November 2003
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   No Longer Our Product
Availability:   Out of stock  
The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available.

Table of Contents

Dynamics of molecule-surface interactions from first principles; H2 dissociation dynamics on metals: where do we stand?; Eley-Rideal and hot atom reactions between H atoms on metal and graphite surfaces; Molecular beam scattering at metal surfaces; Dynamics of precursors in activated dissociative chemisorption systems; State-resolved measurements of surface reaction dynamics; Direct and indirect channels to molecular dissociation at metal and metal alloy surfaces; Chemisorption dynamics in the presence of well defined surface defects; Reaction dynamics on supported metal clusters; Laser-induced desorption from metal and oxide surfaces; Diffusion on semiconductor group IV (001) surfaces; Diffusion of vacancies in metal surfaces: theory and experiment.

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