Stress and Strain Engineering at Nanoscale in Semiconductor Devices
Author:   Chinmay K. Maiti (SOA University Bhubaneswar, Odisha, India)
Publisher:   Taylor & Francis Ltd
ISBN:  

9780367519292


Pages:   260
Publication Date:   30 June 2021
Format:   Hardback
Availability:   In Print   Availability explained
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Stress and Strain Engineering at Nanoscale in Semiconductor Devices


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Author:   Chinmay K. Maiti (SOA University Bhubaneswar, Odisha, India)
Publisher:   Taylor & Francis Ltd
Imprint:   CRC Press
Weight:   0.453kg
ISBN:  

9780367519292


ISBN 10:   0367519291
Pages:   260
Publication Date:   30 June 2021
Audience:   College/higher education ,  General/trade ,  Tertiary & Higher Education ,  General
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

Table of Contents

Chapter 1. Introduction Chapter 2. Simulation Environment Chapter 3. Stress Generation Techniques in CMOS Technology Chapter 4. Electronic Properties of Engineered Substrates Chapter 5. Bulk-Si FinFETs Chapter 6. Strain-Engineered FinFETs at NanoScale Chapter 7. Technology CAD of III-Nitride Based Devices Chapter 8. Strain-Engineered SiGe Channel TFT for Flexible Electronics

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Author Information

Professor Chinmay K. Maiti, PhD is an Ex-Professor and Ex-Head of Department from Indian Institute of Technology (IIT) – Kharagpur, India. He then joined the SOA University, Bhubaneswar in May 2015 as a Professor, where he is now on a Visiting Assignment. He is interested in strain-engineering in nanodevices, flexible electronics, and semiconductor device/process simulation research, and microelectronics education. He has published several monographs in Silicon-Germanium, heterostructure-Silicon, and Technology CAD areas. He has edited the ""Selected Works of Professor Herbert Kroemer"", World Scientific, Singapore, 2008.

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