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OverviewRun-to-Run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine runs, thereby minimizing process drift, shift, and variability and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run-to-Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control. Full Product DetailsAuthor: James Moyne (University of Michigan, Ann Arbor, USA) , Arnon Max HurwitzPublisher: CRC Press Imprint: CRC Press ISBN: 9781280652882ISBN 10: 1280652888 Pages: 367 Publication Date: 01 January 2001 Audience: General/trade , General Format: Electronic book text Publisher's Status: Active Availability: Available To Order We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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