Pattern Analysis and Machine Intelligence: Second International Conference, ICPAMI 2025, Dalian, China, October 31 - November 2, 2025, Revised Selected Papers

Author:   Jie Yang ,  Ran He ,  Shiwei Ma
Publisher:   Springer Verlag, Singapore
ISBN:  

9789819595242


Pages:   232
Publication Date:   27 May 2026
Format:   Paperback
Availability:   In Print   Availability explained
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Pattern Analysis and Machine Intelligence: Second International Conference, ICPAMI 2025, Dalian, China, October 31 - November 2, 2025, Revised Selected Papers


Overview

This book constitutes the referred proceedings of the Second International Conference on Pattern Analysis and Machine Intelligence, ICPAMI 2025, held in Dalian, China, during August 29–31, 2025. The 23 papers presented here were carefully reviewed and selected from 51 submissions. Their insightful talks covered the applications, challenges, and future directions of Multimodal Foundation and Large Language Models, the frontiers and perspectives in 3D Spatial Video Reconstruction, and research on defenses and out-of-distribution detection in trustworthy deep learning.

Full Product Details

Author:   Jie Yang ,  Ran He ,  Shiwei Ma
Publisher:   Springer Verlag, Singapore
Imprint:   Springer Verlag, Singapore
ISBN:  

9789819595242


ISBN 10:   981959524
Pages:   232
Publication Date:   27 May 2026
Audience:   Professional and scholarly ,  College/higher education ,  Professional & Vocational ,  Postgraduate, Research & Scholarly
Format:   Paperback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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