Optical Lithography for Advanced Semiconductor Patterning
Author:   Peter De Bisschop
Publisher:   SPIE Press
ISBN:  

9781510680333


Pages:   1156
Publication Date:   31 May 2025
Format:   Hardback
Availability:   Out of stock   Availability explained
The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available.

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Optical Lithography for Advanced Semiconductor Patterning


Overview

Optical lithography is one of the key technologies in the fabrication of microchips. This book gives an account of modern lithography during the first half of the 2020s, when high-NA extreme-ultraviolet lithography (EUVL) was being introduced. Central to the book is a comprehensive description of the effects that impact the quality of the optical image inside the resist layer, a story that has become more complicated with every new lithography tool generation. This discussion builds gradually so that anyone with a graduate-type background in physics, chemistry, or mathematics can follow it from the start to the many subtleties of image formation in high-NA EUVL. It uses mathematics when useful and is accompanied by examples and case studies, many of which were created specifically for this book. This book will be of value for people who are new to lithography as well as for the more experienced lithographer.

Full Product Details

Author:   Peter De Bisschop
Publisher:   SPIE Press
Imprint:   SPIE Press
ISBN:  

9781510680333


ISBN 10:   1510680330
Pages:   1156
Publication Date:   31 May 2025
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Out of stock   Availability explained
The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available.

Table of Contents

Introduction to Optical Lithography Patterning Techniques Semiconductor Applications: Logic and SRAM CMOS Memory General Design and Key Properties of the Projection System Calculation of the Image Intensity: An Initial Treatment Periodic Structures and Resolution Limits Defocus and Focus-Related Topics Vector Effects Thin-Film Effects M3D Effects EUV-Specific Imaging Topics Lens Aberrations and Other Image Disturbances Resist Impact on Lithographic-Performance Metrics Stochastic Effects Computational Lithography for Full Chip

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