Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing

Author:   Tadahiro Ohmi (Tohoku University, Sendai, Japan) ,  Tadahiro Ohmi (Tohoku University, Sendai, Japan) ,  Hitoshi Morinaga (NICHe Tohoku University, Sendai, Japan) ,  Hiroto Izumi
Publisher:   Taylor & Francis Inc
ISBN:  

9780849335433


Pages:   400
Publication Date:   21 December 2005
Format:   Hardback
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing


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Author:   Tadahiro Ohmi (Tohoku University, Sendai, Japan) ,  Tadahiro Ohmi (Tohoku University, Sendai, Japan) ,  Hitoshi Morinaga (NICHe Tohoku University, Sendai, Japan) ,  Hiroto Izumi
Publisher:   Taylor & Francis Inc
Imprint:   CRC Press Inc
Dimensions:   Width: 17.80cm , Height: 2.70cm , Length: 25.40cm
Weight:   0.900kg
ISBN:  

9780849335433


ISBN 10:   0849335434
Pages:   400
Publication Date:   21 December 2005
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

Table of Contents

Surface Chemical Electronics at the Semiconductor Surface. Principles of Semiconductor Device Wet Cleaning. High-Performance Wet-Cleaning Technology. Etching of Various SiO2. Silicon Etching. Chemical Composition Control Technology. Wet Vapor Resist Stripping Technology. Antistatic Technology. Chemical Waste Reclamation Technology. Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility.

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Tadahiro Ohmi

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