|
|
|||
|
||||
OverviewFull Product DetailsAuthor: Tadahiro Ohmi (Tohoku University, Sendai, Japan) , Tadahiro Ohmi (Tohoku University, Sendai, Japan) , Hitoshi Morinaga (NICHe Tohoku University, Sendai, Japan) , Hiroto IzumiPublisher: Taylor & Francis Inc Imprint: CRC Press Inc Dimensions: Width: 17.80cm , Height: 2.70cm , Length: 25.40cm Weight: 0.900kg ISBN: 9780849335433ISBN 10: 0849335434 Pages: 400 Publication Date: 21 December 2005 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: In Print This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsSurface Chemical Electronics at the Semiconductor Surface. Principles of Semiconductor Device Wet Cleaning. High-Performance Wet-Cleaning Technology. Etching of Various SiO2. Silicon Etching. Chemical Composition Control Technology. Wet Vapor Resist Stripping Technology. Antistatic Technology. Chemical Waste Reclamation Technology. Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility.ReviewsAuthor InformationTadahiro Ohmi Tab Content 6Author Website:Countries AvailableAll regions |
||||