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OverviewThe purpose of this book is to help semiconductor inspection equipment users and manufacturers understand what nano dimensional standards are used to calibrate their equipment and how to employ them effectively. Reviewing trends and developments in nanoscale standards, the book starts with an introductory overview of nanometrological standards before proceeding to detail pitch standard, step height, line width, nano particle size, and surface roughness. This book is essential for users making quantitative nanoscale measurements, be that in a commercial or academic research setting, or involved in engineering nanometrology for quality control in industrial applications. Here the author provides an approachable understanding and application of the nanoscale standards in a practical context across a range of common nanoscale measurement modalities, including 3D, with particular emphasis on applications to AFM, an exceptional and arguably the most common technique used in nanometrology due to the ease of use and versatility of applications. Key features Practical guide for users and practitioners Puts nanoscale standards in a practical context Covers a range of measurement modalities 2D and 3D measurements. Full Product DetailsAuthor: Ichiko Misumi (National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan)Publisher: Institute of Physics Publishing Imprint: Institute of Physics Publishing Dimensions: Width: 17.80cm , Height: 0.60cm , Length: 25.40cm Weight: 0.384kg ISBN: 9780750331890ISBN 10: 0750331895 Pages: 92 Publication Date: 20 May 2021 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: In Print  This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsPreface 1 Nano dimensional standards 2 One-dimensional grating 3 Step height 4 Two-dimensional grating 5 Line width 6 Nano particle size 7 Surface Roughness 8 Secondary realization of the SI meter using silicon lattice parametersReviewsAuthor InformationDr Misumi graduated with a degree in precision machinery engineering, from the University of Tokyo in 1996 and obtained her Doctor of Engineering from the University of Tokyo in 2004. She joined the National Research Laboratory of Metrology (NRLM) in 2000. In 2001, NRLM was renamed the National Metrology Institute of Japan (NMIJ). She received 'Outstanding Precision Measurement Paper Award 2005' from Measurement Science and Technology, Institute of Physics (IOP), and 'Highly Commended Paper Award 2007', again from Measurement Science and Technology, Institute of Physics (IOP). She also received 'Award for Science and Technology (Development Category), The Commendation for Science and Technology by the Minister of Education, Culture, Sports, Science and Technology' in 2011. Tab Content 6Author Website:Countries AvailableAll regions |
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