Overview

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, and so on. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. ""Nanolithography"" contains updated reviews by experts on the well-established techniques - electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) - as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Full Product Details

Author:   M. Gentili ,  Carlo Giovannella ,  Stefano Selci
Publisher:   Springer
Imprint:   Springer
Edition:   1994 ed.
Volume:   264
Dimensions:   Width: 15.50cm , Height: 1.40cm , Length: 23.50cm
Weight:   1.110kg
ISBN:  

9780792327943

ISBN 10:   0792327942
Pages:   216
Publication Date:   30 April 1994
Audience:   College/higher education ,  Professional and scholarly ,  Postgraduate, Research & Scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print  
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Table of Contents

Content.- Electron Beam Lithography.- Nanolithography, The Integrated System.- Electron Beam Resists and Pattern Transfer Methods.- Nanolithography Developed Through Electron-Beam-Induced Surface Reaction.- Direct Writing of Nanoscale Patterns in SiO2.- Sub-10 nm Electron Beam Lithography: -AlF-Doped Lithium Fluoride as a Resist.- Surface Imaging for EB-Nanolithography.- Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier.- Fabrication of Ultrasmail InGaAslInP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching.- Fabrication, Investigation and Manipulation of Artificial Nanostructures.- Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition.- Nanolithography Requirements — An Equipment Manufacturers View.- X-Ray Lithography.- X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing.- X-Ray Phase Shifting Masks.- Fabrication of X-Ray Mask for Nanolithography by EBL.- Ion Beam Lithography.- Intense Focused Ion Beams for Nanostructurisation.- Latest Results Obtained with the Alpha Ion Projection Machine.- STM Lithography.- Direct Writing with a Combined STM/SEM System.- Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope.- STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide.- Sub-20 nm Lithographic Patterning with the STM.- Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope.- Author Index.

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