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9781439849590

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... this book, by covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, is as timely as ever for device and process engineers. Though it involves quite a lot of physics, it is never less than fascinating, through its many intuitive illustrations and tables. --From the Foreword by Hiroshi Iwai, PhD, Professor, Tokyo Institute of Technology, Japan

... this book, by covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, is as timely as ever for device and process engineers. Though it involves quite a lot of physics, it is never less than fascinating, through its many intuitive illustrations and tables. -From the Foreword by Hiroshi Iwai, PhD, Professor, Tokyo Institute of Technology, Japan

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Hei Wong received a B.Sc. degree iIi electronics from the Chinese University of Hong Kong and a Ph.D. in electrical and electronic engineering from the University of Hong Kong. Dr. Wong joined the faculty of the Department of Electronic Engineering at City University of Hong Kong in 1989 and is currently a full professor of the Department. He was a visiting professor for the 21 Century Centre of Excellent (COE21) for Photonics-Nanodevice Integration Engineering, Tokyo Institute of Technology, Japan. Dr. Wong was the chair for the IEEE ED/SSC Hong Kong Joint Chapter during 2002-2003. He is a member of the international steering committees, technical program committees, and organizing committees for many international and local conferences.

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