MOS Interface Physics, Process and Characterization
Author:   Shengkai Wang ,  Xiaolei Wang
Publisher:   Taylor & Francis Ltd
ISBN:  

9781032106281


Pages:   162
Publication Date:   29 January 2024
Format:   Paperback
Availability:   In Print   Availability explained
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MOS Interface Physics, Process and Characterization


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Author:   Shengkai Wang ,  Xiaolei Wang
Publisher:   Taylor & Francis Ltd
Imprint:   CRC Press
Weight:   0.453kg
ISBN:  

9781032106281


ISBN 10:   103210628
Pages:   162
Publication Date:   29 January 2024
Audience:   College/higher education ,  Professional and scholarly ,  Tertiary & Higher Education ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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Shengkai Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the University of Tokyo in 2011 and has been engaged in Ge, III-V, SiC in MOS technology. He has published more than 100 papers and authorized 40+ patents. Xiaolei Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the Institute of Microelectronics, Chinese Academy of Sciences in 2013 and has been engaged in Si/Ge based MOS technology. He has published more than 100 papers.

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