Overview

Numerical modeling of reactors for chemical vapor deposition has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD Processes -, which were performed independently under very different boundary conditions. On the one side, Chris Kleijn, working in the adacemic research environment of Technical University Delft, was able to go deep enough into the subject to lay a solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab at Siemens corporate research and development, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Therefore this book combines an extensive presentation of models and numerical methods used in CVD simulation with a variety of technical applications for tungsten deposition in semiconductor technology. Since this is the first book to cover all features of CVD simulation it will not only be interesting for specialists in tungsten CVD modeling, but also provide a solid foundation for scientists and graduate students engaged in CVD simulation of other materials. Moreover, the book is also intended for engineers working in the field of tungsten deposition, who are interested in the potential of numerical modeling.

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