|
![]() |
|||
|
||||
OverviewFull Product DetailsAuthor: Shanalyn Kemme (Sandia National Laboratories, Albuquerque, New Mexico, USA)Publisher: Taylor & Francis Inc Imprint: CRC Press Inc Dimensions: Width: 15.60cm , Height: 1.80cm , Length: 23.40cm Weight: 0.521kg ISBN: 9780849336768ISBN 10: 0849336767 Pages: 230 Publication Date: 27 August 2009 Audience: Professional and scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: In Print ![]() This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsFabricating Surface-Relief Diffractive Optical Elements. Fabrication of Microoptics with Plasma Etching Techniques. Analog Lithography with Phase-Grating Masks. Electron Beam Lithography for the Nanofabrication of Optical Devices. Nanoimprint Lithography and Device Applications. Design and Fabrication of Planar Photonic Crystals. Fabrication of 3D Photonic Crystals: Molded Tungsten Approach.ReviewsAuthor InformationShanalyn Kemme joined Sandia Laboratories in 1998. She received her master’s degree in physics in 1985 from Kansas State University. She worked for a defense contractor for eight years before going back to school at the Optical Sciences Center at the University of Arizona, where she obtained her Ph.D. in optical sciences in 1998. Tab Content 6Author Website:Countries AvailableAll regions |