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Author:   Robinson ,  Lawson
Publisher:   Elsevier Health Sciences
Imprint:   Elsevier / The Lancet
Volume:   11
Weight:   1.450kg
ISBN:  

9780081003541

ISBN 10:   0081003544
Pages:   634
Publication Date:   18 November 2016
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Available To Order  
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Table of Contents

1. Overview of materials and processes for lithography 2. Molecular excitation and relaxation of extreme ultraviolet lithography photoresists 3. Theory: Electron-induced chemistry 4. EUV lithography process challenges 5. EUV lithography patterning challenges 6. The chemistry and application of nonchemically amplified (non-CA) chain-scission resists 7. Chemically amplified resists and acid amplifiers 8. Negative-tone organic molecular resists 9. Positive molecular resists 10. Mainstreaming inorganic metal-oxide resists for high-resolution lithography 11. Molecular organometallic resists for EUV (MORE) 12. SML electron beam resist: Ultra-high aspect ratio nanolithography 13. Alternative resist approaches 14. Next generation lithography-the rise of unconventional methods? 15. Tip-based nanolithography methods and materials 16. Thermal scanning probe lithography 17. Scanning helium ion beam lithography

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Author Information

Dr Robinson obtained his PhD in 1999 for work on the development of materials for electron beam lithography performed at the Nanoscale Physics Research Laboratory of the University of Birmingham, and the Joint Research Center for Atom Technology in Japan. Following his PhD he investigated the modification of oxide surfaces using self-assembled monolayer, before returning to the Nanoscale Physics Research Laboratory to continue his research in lithography and microfabrication. He has recently taken up a Senior Research Fellowship in the Science City Research Alliance, based in the School of Chemical Engineering and the School of Chemistry at the Universities of Birmingham and Warwick respectively. He is currently investigating the application of advanced materials within the field of microfabrication, and the integration of functional materials with patterned substrates. Dr Lawson received his B.S. in Chemical Engineering at Tennessee Technological University in 2005. He received a Ph.D. in Chemical & Biomolecular Engineering in 2011 at the Georgia Institute of Technology where he also completed a Postdoctoral Fellowship. Since 2015, he has been at Milliken & Company where he is a Research Engineer working in the area of chemical technologies. He is an author of over 22 publications, 41 conference proceedings, and a U.S. Patent in the area of patterning materials including photoresist and block copolymer design, synthesis, and characterization along with simulation of resist processing and BCP self-assembly.

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