Low-K Nanoporous Interdielectrics: Materials, Thin Film Fabrications, Structures & Properties
Author:   Moonhor Ree ,  Jinhwan Yoon ,  Kyuyoung Heo
Publisher:   Nova Science Publishers Inc
ISBN:  

9781616687496


Pages:   67
Publication Date:   19 March 2011
Format:   Paperback
Availability:   Awaiting stock   Availability explained
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Low-K Nanoporous Interdielectrics: Materials, Thin Film Fabrications, Structures & Properties


Overview

The use of low dielectric constant (low-k) interdielectrics in multilevel structure integrated circuits (ICs) can lower line-to-line noise in interconnects and alleviate power dissipation issues by reducing the capacitance between the interconnect conductor lines. Because of these merits, low-k interdielectric materials are currently in high demand in the development of advanced ICs. One important approach to obtaining low-k values is the incorporation of nanopores into dielectrics. This book provides an overview of the methodologies and characterisation techniques used for investigating low-k nanoporous interdielectrics.

Full Product Details

Author:   Moonhor Ree ,  Jinhwan Yoon ,  Kyuyoung Heo
Publisher:   Nova Science Publishers Inc
Imprint:   Nova Science Publishers Inc
Dimensions:   Width: 23.00cm , Height: 0.50cm , Length: 15.50cm
Weight:   0.138kg
ISBN:  

9781616687496


ISBN 10:   1616687495
Pages:   67
Publication Date:   19 March 2011
Audience:   College/higher education ,  Undergraduate ,  Postgraduate, Research & Scholarly
Format:   Paperback
Publisher's Status:   Active
Availability:   Awaiting stock   Availability explained
The supplier is currently out of stock of this item. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out for you.

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