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OverviewIon implantation has become a basic technology in device manufacturing. For efficient use of this accelerator-based technique the choice of appropriate ion sources is important. This book deals with the design and operation of ion sources. Additionally the physics of ion formation of the various elements with different charge states and charge neutralization are discussed. Ion selection and beam diagnostics are part of the book too. The presentation of the necessary equations and diagrams for the various parameters makes this book useful as a handbook for ion sources. Full Product DetailsAuthor: Huashun Zhang , Jianrong ZhangPublisher: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG Imprint: Springer-Verlag Berlin and Heidelberg GmbH & Co. K Edition: Softcover reprint of hardcover 1st ed. 1999 Dimensions: Width: 15.50cm , Height: 2.50cm , Length: 23.50cm Weight: 0.753kg ISBN: 9783642085024ISBN 10: 3642085024 Pages: 476 Publication Date: 03 December 2010 Audience: Professional and scholarly , General/trade , Professional & Vocational Format: Paperback Publisher's Status: Active Availability: In Print ![]() This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |