Ion Implantation Technology
Author:   Jiro Matsuo ,  Masataka Kase ,  Takaaki Aoki ,  Toshio Seki
Publisher:   American Institute of Physics
Edition:   2011 ed.
Volume:   1321
ISBN:  

9780735408760


Pages:   532
Publication Date:   25 January 2011
Format:   Mixed media product
Availability:   In Print   Availability explained
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Ion Implantation Technology


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Overview

The proceedings of 18th International conference on Ion Implantation Technology (IIT2010) covers all aspect of ion implantation, from the fundamentals of ion-solid interactions to industrial applications of the latest implantation machines and device manufacturing.

Full Product Details

Author:   Jiro Matsuo ,  Masataka Kase ,  Takaaki Aoki ,  Toshio Seki
Publisher:   American Institute of Physics
Imprint:   American Institute of Physics
Edition:   2011 ed.
Volume:   1321
Dimensions:   Width: 22.10cm , Height: 3.60cm , Length: 27.90cm
Weight:   1.456kg
ISBN:  

9780735408760


ISBN 10:   0735408769
Pages:   532
Publication Date:   25 January 2011
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Mixed media product
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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