Ion Implantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006
Author:   Karen J. Kirkby ,  Russell M. Gwilliam ,  Andy Smith ,  David Chivers, QC
Publisher:   American Institute of Physics
Edition:   2006 ed.
Volume:   v. 866
ISBN:  

9780735403666


Pages:   664
Publication Date:   01 December 2006
Format:   CD-ROM
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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Ion Implantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006


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Overview

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

Full Product Details

Author:   Karen J. Kirkby ,  Russell M. Gwilliam ,  Andy Smith ,  David Chivers, QC
Publisher:   American Institute of Physics
Imprint:   American Institute of Physics
Edition:   2006 ed.
Volume:   v. 866
Dimensions:   Width: 16.70cm , Height: 1.00cm , Length: 14.50cm
Weight:   0.082kg
ISBN:  

9780735403666


ISBN 10:   073540366
Pages:   664
Publication Date:   01 December 2006
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   CD-ROM
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

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