Investigation of Inversion Layer Mobility in N-Channel Mosfets with Thin Gate Oxide
Author:   陳添華 ,  Tim-Wah Chan
Publisher:   Open Dissertation Press
ISBN:  

9781374743380


Publication Date:   27 January 2017
Format:   Hardback
Availability:   Temporarily unavailable   Availability explained
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Investigation of Inversion Layer Mobility in N-Channel Mosfets with Thin Gate Oxide


Overview

This dissertation, Investigation of Inversion Layer Mobility in N-channel Mosfets With Thin Gate Oxide by 陳添華, Tim-wah, Chan, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. DOI: 10.5353/th_b3120651 Subjects: Thin films - SurfacesMetal oxide semiconductors

Full Product Details

Author:   陳添華 ,  Tim-Wah Chan
Publisher:   Open Dissertation Press
Imprint:   Open Dissertation Press
Dimensions:   Width: 21.60cm , Height: 1.40cm , Length: 27.90cm
Weight:   0.807kg
ISBN:  

9781374743380


ISBN 10:   1374743380
Publication Date:   27 January 2017
Audience:   General/trade ,  General
Format:   Hardback
Publisher's Status:   Active
Availability:   Temporarily unavailable   Availability explained
The supplier advises that this item is temporarily unavailable. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out to you.

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