Interconnect Noise Optimization in Nanometer Technologies
Author:   Mohamed Elgamel ,  Magdy A. Bayoumi
Publisher:   Springer-Verlag New York Inc.
Edition:   1st ed. Softcover of orig. ed. 2006
ISBN:  

9781441938442


Pages:   137
Publication Date:   29 October 2010
Format:   Paperback
Availability:   Out of print, replaced by POD   Availability explained
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Interconnect Noise Optimization in Nanometer Technologies


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Author:   Mohamed Elgamel ,  Magdy A. Bayoumi
Publisher:   Springer-Verlag New York Inc.
Imprint:   Springer-Verlag New York Inc.
Edition:   1st ed. Softcover of orig. ed. 2006
Dimensions:   Width: 15.50cm , Height: 0.80cm , Length: 23.50cm
Weight:   0.454kg
ISBN:  

9781441938442


ISBN 10:   1441938443
Pages:   137
Publication Date:   29 October 2010
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   Out of print, replaced by POD   Availability explained
We will order this item for you from a manufatured on demand supplier.

Table of Contents

Noise Analysis and Design in Deep Submicron.- Interconnect Noise Analysis and Optimization Techniques.- Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies.- Minimum Area Shield Insertion for Inductive Noise Reduction.- Spacing Algorithms for Crosstalk Noise Reduction.- Post Layout Interconnect Optimization for Crosscoupling Noise Reduction.- 3D Integration.- EDA Industry Tools: State of the ART.

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