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OverviewThe characteristics of the porous Si layer formed by silver enhanced chemical etching of p-Si in aqueous HF/HNO3 solution are influenced by the concentration of Ag ions in the plating bath, the concentrations of both the etchant (HF) and the oxidizing agent (HNO3), and the etching time of the Si substrate. The SEM outcomes confirmed that deposition of silver ions from 1.0 � 10-3 M AgNO3 solution on p-Si before the chemical etching in HF/HNO3 resulted in uniformly PSL in a comparison with the other silver nitrate concentrations. The impedance data revealed that when the concentrations of HF and nitric acid rise, so does Si dissolution. The manufacture of PSL with regular and small diameter round holes was faster with Ag-modified chemical etching of p-Si than with traditional stain etching in the same etchant solution, which produced pores of considerable width. The lack of a silver peak in the EDX measurements for the resultant PSL from Ag-assistance chemical etching suggested that the deposited Ag had fully dissolved in the solution after etching. The results of SEM and AFM revealed that the nanopore diameter and surface roughness increased as the etching duration raised. Full Product DetailsAuthor: Awad MogodaPublisher: LAP Lambert Academic Publishing Imprint: LAP Lambert Academic Publishing Dimensions: Width: 15.20cm , Height: 0.40cm , Length: 22.90cm Weight: 0.100kg ISBN: 9786207450336ISBN 10: 6207450337 Pages: 60 Publication Date: 06 December 2023 Audience: General/trade , General Format: Paperback Publisher's Status: Active Availability: In Print ![]() This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |