Overview
This book is an English translation of Die Lehre von der Bildentstehung im Mikroskop von Ernst Abbe, the only published detailed account of Abbe's theory of image formation in the microscope. The original German edition, written and published by Otto Lummer and Fritz Reiche in 1910, was an expanded version of the lectures given by Abbe in 1887. The book presents an introduction to geometrical optics, discusses image formation theory based on optical diffraction, and deals with optical images of several kinds of objects being illuminated on and off axis. It also introduces coherent imaging as two back-to-back diffraction processes and discusses the resolution limit of an imaging system. The book concludes with a discussion of the effect of artificial blocking of certain diffraction orders on the final image. This translation, which includes annotations and other added material, can serve as a self-study book for readers who wish to learn optics and optical image formation. It is also a tribute to the original authors' scientific achievements and devotion to the teaching and dissemination of precious knowledge.
Full Product Details
Author: Anthony Yen ,
Martin Burkhardt
Publisher: SPIE Press
Imprint: SPIE Press
Weight: 0.272kg
ISBN: 9781510655232
ISBN 10: 1510655239
Pages: 244
Publication Date: 30 December 2023
Audience:
Professional and scholarly
,
Professional & Vocational
Format: Paperback
Publisher's Status: Active
Availability: In Print
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Author Information
Anthony Yen is Vice President and Head of Technology Development Center at ASML. He received BSEE from Purdue University and SM, EE, PhD, and MBA from MIT. After receiving his doctorate, he was Member of Technical Staff at Texas Instruments and was on assignment at IMEC. From 1997 to 2017, apart from three years at Cymer (now part of ASML), he was with TSMC where he first led the development of its lithography processes, making TSMC the first company to adopt 193-nm lithography in the manufacture of logic integrated circuits, and then co-led infrastructure development for next-generation-lithography technologies on assignment at SEMATECH; in his last ten years of career at TSMC, he led the development of EUV lithography, including its mask technology, for high-volume manufacturing. Yen is Fellow of SPIE and IEEE. He is a recipient of the Frits Zernike Award for Microlithography from SPIE and the Outstanding Electrical and Computer Engineer Award from Purdue University. He serves as a Distinguished Lecturer for the IEEE Electron Devices Society. Dr. Martin Burkhardt, Fellow Member, IBM Thomas J Watson Research Center.
