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OverviewThis text describes recent developments in optical techniques for extracting surface and interface information with a resolution of less than a single atomic layer. These ""epioptic"" techniques are now widely applied to semiconductor surfaces and interfaces and include polarised reflection techniques such as reflection anisotropy spectroscopy and spectroscopic ellipsometry, Raman scattering, and optical second harmonic and sum frequency generation. Epioptics has great potential in the area of growth monitoring, and in situ monitoring of semiconductor growth with submonolayer sensitivity has now been demonstrated in growth reactors under normal operating conditions. The book emphasizes recent studies of submonolayer growth on semiconductor surfaces. Full Product DetailsAuthor: J.F. McGilp , etc. , D. Weaire , C. Patterson (University of Dublin, Ireland)Publisher: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG Imprint: Springer-Verlag Berlin and Heidelberg GmbH & Co. K Weight: 0.500kg ISBN: 9783540594109ISBN 10: 3540594108 Pages: 242 Publication Date: 09 October 1995 Audience: College/higher education , Professional and scholarly , Postgraduate, Research & Scholarly , Professional & Vocational Format: Hardback Publisher's Status: Active Availability: Out of stock ![]() The supplier is temporarily out of stock of this item. It will be ordered for you on backorder and shipped when it becomes available. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |