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OverviewThis dissertation, Electrical Characterization of Si-SiO2 Interface for Thin Oxides by 洪國光, Kwok-kwong, Hung, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. DOI: 10.5353/th_b3123086 Subjects: Silicon - Electric propertiesSilicon oxide films Full Product DetailsAuthor: 洪國光 , Kwok-Kwong HungPublisher: Open Dissertation Press Imprint: Open Dissertation Press Dimensions: Width: 21.60cm , Height: 1.90cm , Length: 27.90cm Weight: 1.002kg ISBN: 9781374766150ISBN 10: 1374766151 Publication Date: 27 January 2017 Audience: General/trade , General Format: Hardback Publisher's Status: Active Availability: Temporarily unavailable The supplier advises that this item is temporarily unavailable. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out to you. Table of ContentsReviewsAuthor InformationTab Content 6Author Website:Countries AvailableAll regions |
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