Design for Manufacturability with Advanced Lithography
Author:   Bei Yu ,  David Z. Pan
Publisher:   Springer International Publishing AG
Edition:   1st ed. 2016
ISBN:  

9783319203843


Pages:   164
Publication Date:   23 November 2015
Format:   Hardback
Availability:   Manufactured on demand   Availability explained
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Design for Manufacturability with Advanced Lithography


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Overview

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Full Product Details

Author:   Bei Yu ,  David Z. Pan
Publisher:   Springer International Publishing AG
Imprint:   Springer International Publishing AG
Edition:   1st ed. 2016
Dimensions:   Width: 15.50cm , Height: 1.10cm , Length: 23.50cm
Weight:   3.908kg
ISBN:  

9783319203843


ISBN 10:   3319203843
Pages:   164
Publication Date:   23 November 2015
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

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