CMOS Plasma and Process Damage

Author:   Kirk Prall
Publisher:   Springer International Publishing AG
ISBN:  

9783031890284


Pages:   466
Publication Date:   17 May 2025
Format:   Hardback
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

Our Price $284.60 Quantity:  
Add to Cart

Share |

CMOS Plasma and Process Damage


Overview

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems. 

Full Product Details

Author:   Kirk Prall
Publisher:   Springer International Publishing AG
Imprint:   Springer International Publishing AG
ISBN:  

9783031890284


ISBN 10:   3031890280
Pages:   466
Publication Date:   17 May 2025
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

Table of Contents

Reviews

Author Information

Kirk D. Prall (M'82) was born in 1958. He received the Ph.D. degree in electrical engineering from the University of New Mexico, Albuquerque, in 1990. He worked for Philips Semiconductors from 1982 to 1991, in the areas of EPROM, ROM, microprocessors. He joined Micron, Inc., Boise, ID, in 1991 working on DRAM, NOR, NAND, and emerging memories. He retired from Micron in 2019 and is currently writing engineering books. He has published several papers and holds more than 200 patents.

Tab Content 6

Author Website:  

Countries Available

All regions
Latest Reading Guide

MRGC26

 

Shopping Cart
Your cart is empty
Shopping cart
Mailing List