Chemical Vapour Deposition (CVD): Advances, Technology and Applications
Author:   Kwang-Leong Choy (University of Nottingham, UK)
Publisher:   Taylor & Francis Ltd
ISBN:  

9780367780111


Pages:   398
Publication Date:   31 March 2021
Format:   Paperback
Availability:   In Print   Availability explained
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Chemical Vapour Deposition (CVD): Advances, Technology and Applications


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Author:   Kwang-Leong Choy (University of Nottingham, UK)
Publisher:   Taylor & Francis Ltd
Imprint:   CRC Press
Weight:   0.734kg
ISBN:  

9780367780111


ISBN 10:   0367780119
Pages:   398
Publication Date:   31 March 2021
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Paperback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

Table of Contents

1: Introduction; 2: Chemical vapour deposition of ultrafine particles; 3: CVD of nanowires and nanotubes, mass production, and industrialization; 4: CVD of flat monolayer of 2D atomics honeycomb structure and their applications; 5: CVD of superlattice films and their applications; 6: CVD coatings; 7: CVD of nanocomposite coatings; 8: Chemical vapour infiltration of composites and their applications

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Kwang Leong Choy

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