Chemical Etching Behaviour of a Polyimide

Author:   Deep Shikha
Publisher:   Grin Publishing
ISBN:  

9783668084186


Pages:   28
Publication Date:   10 November 2015
Format:   Paperback
Availability:   Available To Order   Availability explained
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Chemical Etching Behaviour of a Polyimide


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Overview

Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 DegreesC and at 500 DegreesC temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.

Full Product Details

Author:   Deep Shikha
Publisher:   Grin Publishing
Imprint:   Grin Publishing
Dimensions:   Width: 14.80cm , Height: 0.20cm , Length: 21.00cm
Weight:   0.050kg
ISBN:  

9783668084186


ISBN 10:   3668084181
Pages:   28
Publication Date:   10 November 2015
Audience:   General/trade ,  General
Format:   Paperback
Publisher's Status:   Active
Availability:   Available To Order   Availability explained
We have confirmation that this item is in stock with the supplier. It will be ordered in for you and dispatched immediately.

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