Applied Physics in the 21st Century

Author:   Raymond P Valencia
Publisher:   Nova Science Publishers Inc
ISBN:  

9781608760749


Pages:   410
Publication Date:   26 April 2010
Format:   Hardback
Availability:   In Print   Availability explained
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Applied Physics in the 21st Century


Overview

Applied physics is rooted in the fundamental truths and basic concepts of the physical sciences but is concerned with the utilisation of these scientific principles in practical devices and systems. This book gathers the latest research from around the globe in this dynamic field.

Full Product Details

Author:   Raymond P Valencia
Publisher:   Nova Science Publishers Inc
Imprint:   Nova Science Publishers Inc
Weight:   0.930kg
ISBN:  

9781608760749


ISBN 10:   160876074
Pages:   410
Publication Date:   26 April 2010
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   In Print   Availability explained
This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us.

Table of Contents

Preface; Emerging Concepts & Challenges in Nano Metal Oxide Thin Films; Spectroscopic Analysis of Chemical Species in Carbon Plasmas Induced by High-Power IR CO2 Laser; Induction Transformer Coupled Discharges: Investigation & Application; Features on the High Frequency Dielectric Response in Ferroelectric Materials; The Principle that Generates Configuration in Animate & Inanimate Systems A Unified View; Computational Studies on Drag Reduction Effect by Surface Grooves; Current Limiting in Oxide Ceramic Structures; Characterisation of Silicide Thin Films for Semiconductor & Nanotechnology Electronics; Magnetically Modified Biological Materials as Perspective Adsorbents for Large-Scale Magnetic Separation Processes; Optimisation of Deposition Conditions for Functional Oxide Thin Films; Optical Waveguides Produced by Ion Implantation in Oxide Glasses; Thin Film Piezoelectric Response Coefficient Estimation Techniques; Plasma Technology: An Alternative to Conventional Chemical Processes for Hydrogen Production; Target-plasma-film interactions in high power pulsed magnetron sputtering (HPPMS); Index.

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NOV RG 20252

 

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