Plasma Sources for Thin Film Deposition and Etching
Author:   Maurice H. Francombe (Georgia State University, Atlanta, U.S.A.) ,  John L. Vossen (RCA Laboratories, Princeton, New Jersey)
Publisher:   Elsevier Science Publishing Co Inc
Volume:   v. 18
ISBN:  

9780125330183


Pages:   328
Publication Date:   29 September 1994
Format:   Hardback
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

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Plasma Sources for Thin Film Deposition and Etching


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Author:   Maurice H. Francombe (Georgia State University, Atlanta, U.S.A.) ,  John L. Vossen (RCA Laboratories, Princeton, New Jersey)
Publisher:   Elsevier Science Publishing Co Inc
Imprint:   Academic Press Inc
Volume:   v. 18
Dimensions:   Width: 15.20cm , Height: 2.10cm , Length: 22.90cm
Weight:   0.720kg
ISBN:  

9780125330183


ISBN 10:   0125330189
Pages:   328
Publication Date:   29 September 1994
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Out of Print
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

Table of Contents

Design of High- Density Plasma Sources for Materials Processing M.A. Lieberman and R.A. Gottscho  Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films O.A. Popov Unbalanced Magnetron Sputtering S.L. Rohde The Formation of Particles in Thin-Film Processing Plasmas Steinbruchel

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