Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications
Author:   Maurice H. Francombe (Georgia State University, Atlanta, U.S.A.) ,  John L. Vossen (RCA Laboratories, Princeton, New Jersey)
Publisher:   Elsevier Science Publishing Co Inc
Volume:   v. 23
ISBN:  

9780125330237


Pages:   311
Publication Date:   14 November 1997
Format:   Hardback
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

Our Price $570.24 Quantity:  
Add to Cart

Share |

Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications


Add your own review!

Overview

Full Product Details

Author:   Maurice H. Francombe (Georgia State University, Atlanta, U.S.A.) ,  John L. Vossen (RCA Laboratories, Princeton, New Jersey)
Publisher:   Elsevier Science Publishing Co Inc
Imprint:   Academic Press Inc
Volume:   v. 23
Dimensions:   Width: 15.20cm , Height: 2.20cm , Length: 22.90cm
Weight:   0.620kg
ISBN:  

9780125330237


ISBN 10:   0125330235
Pages:   311
Publication Date:   14 November 1997
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Out of Print
Availability:   In Print   Availability explained
Limited stock is available. It will be ordered for you and shipped pending supplier's limited stock.

Table of Contents

Reviews

Author Information

Tab Content 6

Author Website:  

Customer Reviews

Recent Reviews

No review item found!

Add your own review!

Countries Available

All regions
Latest Reading Guide

MRG2025CC

 

Shopping Cart
Your cart is empty
 Shopping cart
Mailing List

 

Sign up now