Advances in Imaging and Electron Physics

Author:   Martin Hÿtch (Senior Scientist, French National Centre for Research (CNRS), Toulouse, France)
Publisher:   Elsevier Science Publishing Co Inc
ISBN:  

9780443428319


Pages:   232
Publication Date:   01 August 2025
Format:   Hardback
Availability:   Not yet available   Availability explained
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Advances in Imaging and Electron Physics


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Overview

Advances in Imaging and Electron Physics, Volume 235 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Unified formalism of light beam optics and light polarization, Relativistic Theory and Calculation of Electrostatic Focusing Systems, A Nonlinear Representation Theory of Equivariant Deep Learning Using Group Morphology.

Full Product Details

Author:   Martin Hÿtch (Senior Scientist, French National Centre for Research (CNRS), Toulouse, France)
Publisher:   Elsevier Science Publishing Co Inc
Imprint:   Academic Press Inc
Weight:   0.450kg
ISBN:  

9780443428319


ISBN 10:   044342831
Pages:   232
Publication Date:   01 August 2025
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Forthcoming
Availability:   Not yet available   Availability explained
This item is yet to be released. You can pre-order this item and we will dispatch it to you upon its release.

Table of Contents

1. Unified formalism of light beam optics and light polarization 2. Relativistic Theory and Calculation of Electrostatic Focusing Systems 3. A Nonlinear Representation Theory of Equivariant Deep Learning Using Group Morphology

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Author Information

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

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