A Study of Thermally Nitrided Silicon Dioxide Thin Films for Metal-Oxide-Silicon VLSI Techology
Author:   劉志宏 ,  Zhihong Liu
Publisher:   Open Dissertation Press
ISBN:  

9781374757929


Publication Date:   27 January 2017
Format:   Hardback
Availability:   Temporarily unavailable   Availability explained
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A Study of Thermally Nitrided Silicon Dioxide Thin Films for Metal-Oxide-Silicon VLSI Techology


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Author:   劉志宏 ,  Zhihong Liu
Publisher:   Open Dissertation Press
Imprint:   Open Dissertation Press
Dimensions:   Width: 21.60cm , Height: 1.90cm , Length: 27.90cm
Weight:   0.998kg
ISBN:  

9781374757929


ISBN 10:   1374757926
Publication Date:   27 January 2017
Audience:   General/trade ,  General
Format:   Hardback
Publisher's Status:   Active
Availability:   Temporarily unavailable   Availability explained
The supplier advises that this item is temporarily unavailable. It will be ordered for you and placed on backorder. Once it does come back in stock, we will ship it out to you.

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