Plasma Etching Processes for CMOS Devices Realization
Author:   Nicolas Posseme (CEA-LETI, Grenoble, France)
Publisher:   ISTE Press Ltd - Elsevier Inc
ISBN:  

9781785480966


Pages:   136
Publication Date:   18 January 2017
Format:   Hardback
Availability:   Manufactured on demand   Availability explained
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Plasma Etching Processes for CMOS Devices Realization


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Author:   Nicolas Posseme (CEA-LETI, Grenoble, France)
Publisher:   ISTE Press Ltd - Elsevier Inc
Imprint:   ISTE Press Ltd - Elsevier Inc
Weight:   0.350kg
ISBN:  

9781785480966


ISBN 10:   1785480960
Pages:   136
Publication Date:   18 January 2017
Audience:   Professional and scholarly ,  Professional & Vocational
Format:   Hardback
Publisher's Status:   Active
Availability:   Manufactured on demand   Availability explained
We will order this item for you from a manufactured on demand supplier.

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Nicolas Posseme is a Senior Research Scientist in MIcrotechnologie & Nanotechnology and Deputy Head of Plasma Etching & Stripping in the Silicon Technologies division at the CEA-LETI Laboratory in Grenoble, France.

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