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OverviewFull Product DetailsAuthor: Zinetula Insepov (Purdue University, Indiana, USA) , Isao Yamada (Kyoto University, Japan)Publisher: Taylor & Francis Inc Imprint: Chapman & Hall/CRC Dimensions: Width: 15.60cm , Height: 2.00cm , Length: 23.40cm Weight: 0.524kg ISBN: 9781439875421ISBN 10: 1439875421 Pages: 254 Publication Date: 01 April 2016 Audience: College/higher education , Professional and scholarly , Professional and scholarly , Postgraduate, Research & Scholarly , Professional & Vocational Replaced By: 9780367752804 Format: Hardback Publisher's Status: Active Availability: In Print ![]() This item will be ordered in for you from one of our suppliers. Upon receipt, we will promptly dispatch it out to you. For in store availability, please contact us. Table of ContentsReviewsThis book is an enthusiastic presentation of fundamental physical principles and mathematical tools lying behind the new cluster ion beam technology ... This book explains the basic principles and fundamentals of cluster nucleation, formation, and growth in various media, including adsorption layers on the surfaces, in rarefied and dense gases, as well as on various applications of cluster ion beams for surface cleaning and etching and implantation. By doing this, it builds a bridge between the fundamental concepts of thermodynamics and physical kinetics with the new physical and engineering cluster applications ... I believe that the author can be confident that there will be many grateful readers who will gain a broader perspective of the disciplines of cluster science and applications as a result of his efforts. -From the Foreword by Ahmed Hassanein, Paul L. Wattelet Distinguished Professor and Head of Nuclear Engineering, Purdue University This book fulfills a great need in the growing field of cluster ion physics, giving a timely overview of the theory, simulation, and experimental methods. I highly recommend it to students, instructors, and practitioners in the field. -Genri E. Norman, Dr. Habilitus, Joint Institute for High Temperatures of Russian Academy of Sciences, Moscow Institute of Physics and Technology (State University) Professor Insepov's theoretical insights and modeling have illuminated, visualized, predicted, and guided research in the field for many years, and this book will be a key resource for understanding complex phenomena such as the lateral sputtering effect of high velocity clusters impacting on surfaces. -Dr. David R. Swenson, Principal Scientist, Passport Systems, Inc. This book is an enthusiastic presentation of fundamental physical principles and mathematical tools lying behind the new cluster ion beam technology ... The book explains the basic principles and fundamentals of cluster nucleation, formation, and growth in various media, including adsorption layers on the surfaces, in rarefied and dense gases, as well as on various applications of cluster ion beams for surface cleaning and etching and implantation. By explaining the process, it builds a bridge between the fundamental concepts of thermodynamics and physical kinetics with the new physical and engineering cluster applications. ... I believe that the author can be confident that there will be many grateful readers who will gain a broader perspective of the disciplines of cluster science and applications as a result of his efforts. -From the Foreword by Ahmed Hassanein, Paul L. Wattelet Distinguished Professor and Head of Nuclear Engineering, Purdue University """This book fulfills a great need in the growing field of cluster ion physics, giving a timely overview of the theory, simulation, and experimental methods. I highly recommend it to students, instructors, and practitioners in the field."" —Genri E. Norman, Dr. Habilitus, Joint Institute for High Temperatures of Russian Academy of Sciences, Moscow Institute of Physics and Technology (State University) ""Professor Insepov’s theoretical insights and modeling have illuminated, visualized, predicted, and guided research in the field for many years, and this book will be a key resource for understanding complex phenomena such as the lateral sputtering effect of high velocity clusters impacting on surfaces."" —Dr. David R. Swenson, Principal Scientist, Passport Systems, Inc. ""This book is an enthusiastic presentation of fundamental physical principles and mathematical tools lying behind the new cluster ion beam technology … The book explains the basic principles and fundamentals of cluster nucleation, formation, and growth in various media, including adsorption layers on the surfaces, in rarefied and dense gases, as well as on various applications of cluster ion beams for surface cleaning and etching and implantation. By explaining the process, it builds a bridge between the fundamental concepts of thermodynamics and physical kinetics with the new physical and engineering cluster applications. … I believe that the author can be confident that there will be many grateful readers who will gain a broader perspective of the disciplines of cluster science and applications as a result of his efforts."" —From the Foreword by Ahmed Hassanein, Paul L. Wattelet Distinguished Professor and Head of Nuclear Engineering, Purdue University" Author InformationZinetula Insepov is an adjunct professor in the School of Nuclear Engineering at Purdue University and a professor in the Department of Condensed Matter Physics at the Moscow Engineering Physics Institute (MEPhI). He is the chief scientist and head of the Nanosynergy Laboratory at Nazarbayev University. Dr. Insepov is also a founding faculty fellow of the Skolkovo Institute of Science and Technology (Skoltech)/Massachusetts Institute of Technology (MIT) initiative. He has previously held positions at Albert Ludwig University of Freiburg, Kyoto University, Epion Japan, and Argonne National Laboratory. His research focuses on the fundamental physics of ion beam materials processing, including very-low-energy ion–solid interactions. He developed cluster ion beam interaction simulation programs based on molecular dynamics and Monte Carlo methods. He also predicted a new lateral sputtering phenomenon that is a driving force behind the efficient atomistic smoothening mechanism of surfaces irradiated by large gas cluster ions. Recently, he predicted a nanopumping effect and is developing a new device that allows pump gases and liquids via nanometer-scale channels. Tab Content 6Author Website:Countries AvailableAll regions |